期刊文献+

微电子生产工艺可靠性评价与控制 被引量:7

Microelectronics Manufacture Process Reliability Evaluation and Control
下载PDF
导出
摘要 简要介绍了可靠性评估(REM)测试结构设计,并介绍了REM试验中与时间有关的栅氧化层击穿(TDDB)、热载流子注入(HCI)效应和电迁移(EM)效应的评价试验方法及实例。REM技术与工艺过程控制(PCM)、统计工艺控制(SPC)技术结合起来就可以实现对工艺的可靠性评价与控制,某集成电路生产公司将它应用于金属化工艺中,确定了工艺输入变量与电迁移可靠性的相关性,优化了金属化工艺试验条件,提高了金属化系统的抗电迁移能力。 This paper introduces the design of reliability evaluation monitor and the experiment and instances of time dependent dielectric breakdown, hot carrier injection and EM. REM technol- ogy combined with PCM and SPC can be used to evaluate and control the reliability of process. REM technology is applied to metal process of an IC manufacturing company to. determine the rela- tivity of the process input variable with EM reliability, optimize the metal process testing conditions and improve the EM reliability of metal system.
出处 《电子产品可靠性与环境试验》 2004年第3期1-5,共5页 Electronic Product Reliability and Environmental Testing
  • 相关文献

参考文献7

  • 1恩云飞,孔学东,徐征,赵文斌.栅氧化层TDDB可靠性评价试验及模型参数提取[J].电子产品可靠性与环境试验,2002,20(1):1-4. 被引量:4
  • 2恩云飞 章晓文 罗宏伟.集成电路金属化可靠性评价技术[A]..中国电子学会可靠性分会第十届学术年会论文选[C].大同:中国电子学会可靠性分会,2000.233-236.
  • 3孔学东,恩云飞.军用超大规模集成电路中的可靠性技术应用与发展[A].科技委年会论文集[C].北京:科技委员会,2001.
  • 4Paul Heremans, Rudi Bellens, Guido Groeseneken, et al.Consistent model for the Hot-Carrier Degradation in nChannel and p-Channel MOSFET' s [J] . IEEE Transactions Device, 1988, 135 (1): 2194-2209.
  • 5Chenming HU, Simon C, FU-Chien Hsu, et al. Hot Electron-induced MOSFET Degradation-Model, Monitor, and Improvement [J] . IEEE Transactions on Electron Devices,1985-2, ED-32 (2): 375-386.
  • 6Leang S E, Chan D S H, Chim W K. A New Purely-Experimental Technique for Extracting the Spatial Distribution of Hot-Carrier-Induced Interface States and Trapped Charges in MOSFETs [A] . IEEE/IRPS [C] . 1996. 311-317.
  • 7Heremans P, Maes H E, Saks N. Evaluation of Hot Carrier Degradation of N-Channel MOSFET's with the Charge Pumping Technique [J] . IEEE Electron Device Letters,1986, EDL-7: 428-430.

二级参考文献4

  • 1[1]Chen I C, Holland S, Hu C. Electrical Breakdown in Thin Gate and Tunneling Oxides[J]. IEEE Trans. Electron Devices, 1985, ED - 32:413 ~ 422.
  • 2[2]Shiono N, Isumi M. A Lifetime Prediction Model Using Series Model and Acceleration Factors for TDDB Failure of Thin Gate Oxides[A]. IEEE/IRPS[C]. IEEE , 1993. 1 ~ 6.
  • 3[3]James Prendergast, John Suehle, Prasad Chaparala, et al. TDDB Characterisation of Thin SiO2 Films with Bimodal Failure Population[A]. IEEE/IRPS[C]. 1995. 124 ~ 130.
  • 4[4]Jack C L, Chen I C, Hu C. Modeling and Characterization of Gate Oxide Reliability [J] . IEEE Transactions on Electron Device, 1988, 35, (12): 2 268 ~2 277.

共引文献3

同被引文献46

引证文献7

二级引证文献14

相关作者

内容加载中请稍等...

相关机构

内容加载中请稍等...

相关主题

内容加载中请稍等...

浏览历史

内容加载中请稍等...
;
使用帮助 返回顶部