摘要
聚合物膜厚的控制对于优化聚合物发光器件的光电性能是至关重要的。应用最小二乘法,通过对中心复合设计实验数据的拟合,建立了旋涂法制备聚合物薄膜的膜厚回归模型。测试结果表明:利用该模型所得到的预测膜厚与旋涂的实测膜厚基本相符。膜厚模型的建立,对于旋涂工艺中旋涂条件的选择、薄膜厚度的控制以及器件性能的优化具有一定的实用价值。
The polymer film-thickness is one of the key factors influencing the optical and electrical performances of polymer light-emitting device(PLED). In this paper, the regression model of the polymer film-thickness spin-coating is established by using the least squares and the experimental data fitting with central composite design. Test results show that the prediction values gained by using this model are consistent with the measured ones. Thus, this model can be useful for selecting the spin-coating conditions, controlling the thin film thickness and optimizing the device performance.
出处
《半导体光电》
CAS
CSCD
北大核心
2004年第3期191-193,208,共4页
Semiconductor Optoelectronics
关键词
聚合物发光器件
旋涂
最小二乘法
回归模型
polymer light-emitting device
spin-coating
least squares
regression model
