期刊文献+

双路绝缘栅型场效应管亚微秒级电火花脉冲电源 被引量:4

Dual-Channel MOSFET Sub-Microsecond Micro-EnergyPulse Power Source Used in Electrical Discharge Machining
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摘要 以绝缘栅型场效应管 ( MOSFET)作为开关元件的独立式单路控制微能脉冲电源设计存在着缺陷 ,不利于稳定加工 .通过对实验中采集到的波形分析 ,找出了缺陷产生的原因 ,在此基础上 ,设计了双路控制的 MOSFET开关电路 ,并根据 MOSFET的开关特性 ,采用合理电路参数 ,计算出理论波形 .通过对比实验 ,不仅验证了实际波形与理论波形吻合 ,而且改进后的电源可以将波形有效压缩至亚微秒级 ,加工表面放电痕的形貌得到了极大改善 ,提高了加工的尺寸精度和表面精度 。 The single-channel control micro-energy pulse source whose switch element is MOSFET has inherent drawback. There exists an uncertain gap voltage during the pulse interval, which prolongs the discharge time and decreases the surface accuracy seriously. Moreover it drives up the average voltage and results in the misoperation of the control unit. Based on the analysis of the waveshape collected in machining, a dual-channel MOSFET micro-energy pulse power source is designed to make the gap voltage fall down to zero in order to eliminate the uncertain gap voltage. According to the switch characteristics of the MOSFET, reasonable circuit parameters are used, and the theoretical waveshape is calculated. From the waveshape picked during experiment, it shows that the practical waveshape and the theoretical waveshape are anastomotic, and the pulse width can be contracted to sub-microsecond. By means of comparison experiment, it shows that the surface texture is improved remarkably, and the course of machining becomes trouble-free machining. And the dimension accuracy and surface accuracy of the workpiece increase dramatically.
出处 《上海交通大学学报》 EI CAS CSCD 北大核心 2004年第7期1138-1142,共5页 Journal of Shanghai Jiaotong University
关键词 绝缘栅型场效应管 放电加工 脉冲电源 Electric power supplies to apparatus MOSFET devices Pulse width modulation Textures
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  • 1诸邦田.电子电路实用抗干扰技术[M].人民邮电出版社,1996..
  • 2陆纪培 李忠涛.电火花放电微小间隙的控制[J].电加工,1980,(5):20-23.
  • 3刘仁茂.挠性接头电火花加工关键工艺及其数控系统的研究[M].哈尔滨:哈尔滨工业大学,1997..
  • 4沈耀 任志纯 等.TMOS功率场效应管的原理和应用[M].北京:电子工业出版社,1995..
  • 5刘仁茂,学位论文,1997年
  • 6刘晋春,特种加工,1994年
  • 7陆纪培,电加工,1980年,5期,20页

共引文献11

同被引文献17

  • 1闫云飞,张智恩,张力,代长林.太阳能利用技术及其应用[J].太阳能学报,2012,33(S1):47-56. 被引量:164
  • 2Rajurkar K P,Levy GrMalshe A;et al. Micro and Nano Machining by Electro-Physical and Chemical Processes[J]. in CIRP Annals - Manufacturing Technology,2006:643 - 666.
  • 3Han Fuzhu, Chen Li, Yu Dingwen, et al. Basic study on pulse generator for micro-EDM[J ]. The International Journal of Advanced Manufacturing Technology, 2007,33 : 474 - 479.
  • 4崔晶,李勇,熊英.微细电火花加工用多模式脉冲电源的研究[C]//2007年中国机械工程学会年会论文集:第12届全国特种加工学术会议专辑.北京:机械工业出版社.2007:81-84.
  • 5MAULAT O,ROCHE M,PELLETIER J,et al.New line of high voltage high current pulse generators for plasma based ion implantation[J].J Vac Sci Technol,1999,B17(2):879-882.
  • 6REASS W A.Survey of high-voltage pulse technology suitable for large-scale plasma source ion implantation processes[J].J Vac Sci Technol,1994,B12(2):854-860.
  • 7GAUDREAU M P J,CASEY J A,KEMPKES M A,et al.Solid-state modulators for plasma immersion ion implantation applications[J].J Vac Sci Technol,1999,B17(2):888-895.
  • 8TSUI K H,SILVA A V F,COUCEIRO I B,et al.Resonant narrowing of the nitrogen laser pulse by plasma impedance matching[J].IEEE J Quantum Electron,1991,27(3):448-453.
  • 9恒岡まさき,藤田秀男,今井剛,など.DC100kV,100A,360A遮断IGBTスイッチの開発[J].電學論B,1996,116(4):497-498.
  • 10遠藤文彦,岡村勝也,高木茂行,など.高繰返しエキシマレ一ザ一用全固体電源の開発[J].レ一ザ一研究,1996(10):1114-1122.

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