摘要
利用多靶磁控溅射方法分别镀制了W/C和Mo/Si两种周期性结构多层膜。通过对其相关参数周期数、厚度比以及周期厚度的调整 ,使薄膜的布拉格衍射峰出现在布儒斯特角附近 ,两种多层膜的应用能量范围分别落于C的近K边处和Si的L边前。在北京同步辐射装置 3W1B光束线的软X射线光学实验站上进行了反射率的测量 ,得到W /C膜的反射率在 2 14eV时达到 4 .18% ;Mo/Si周期性多层膜的反射率在 89eV处达到 32 .3%。根据测量结果 。
Periodic multilayers of W/C and Mo/Si have been developed with magnetron sputtering technology.The parameters of period and thickness are adjusted so that the first Bragg peak appears at the Brewster angle when the photon energy is in the vicinity of K edge of carbon and L edge of silicon respectively.The experiment was implemented at Beijing Synchrotron Radiation Facility(BSRF).The reflectivities of multilayer Mo/Si and W/C can reach 32.3% at 89eV and 4.18% at 214eV respectively near the Brewster angle.The feasibility of setting up polarizer with multilayers is discussed in this paper.
出处
《高能物理与核物理》
CSCD
北大核心
2004年第8期893-897,共5页
High Energy Physics and Nuclear Physics
基金
国家自然科学基金 (10 2 75 0 78)
上海科技基金 (0 2 2 2 610 49)资助~~