纳米压印光刻技术——下一代批量生产的光刻技术(英文)

Nanoimprint Lithography-A Next Generation High Volume Lithography Technique

纳米压印光刻技术已被证实是纳米尺寸大面积结构复制的最有前途的下一代技术之一。这种速度快、成本低的方法成为生物化学、μ级流化学、μ-TAS和通信器件制造以及纳米尺寸范围内广泛应用的一种日渐重要的方法,如生物医学、纳米流体学、纳米光学应用、数据存储等领域。由于标准光刻系统的波长限制、巨大的开发工作量、以及高昂的工艺和设备成本,纳米压印光刻技术可能成为主流IC产业中一种真正富有竞争性方法。对细小到亚10nm范围内的极小复制结构,纳米压印技术没有物理极限。从几种纳米压印光刻技术中选择两种前景广阔的方法——热压印光刻(HEL)和紫外压印光刻(UV-NIL)技术给予介绍。两种技术对各种各样的材料以及全部作图的衬底大批量生产提供了快速印制。重点介绍了HEL和UV-NIL两种技术的结果。全片压印尺寸达200mm直径,图形分辨力高,拓展到纳米尺寸范围。

Nanoimprint Lithography has been demonstrated to beone of the most promising next generation techniques for large-area structure replication in the nanometer scale. This fast and low cost method becomes an increasingly important instrument for fabrication of biochemistry,ì-fluidic,ì-TAS and telecommunication devices, as well as for a wide variety of fields in the nm range, like biomedical, nano-fluidics, nano-optical applications, data storage, etc. Due to the restrictions on wavelength and the enormous development works, linked to high process and equipment costs on standard lithography systems, nanoimprint lithography might become a real competitive method in mainstream IC industry. There are no physical limitations encountered with imprinting techniques for much smaller replicated structures, down to the sub-10nm range . Among several Nanoimprint lithography techniques results of two promising methods, hot embossing lithography (HEL) and UV-nanoimprinting (UV-NIL) will be presented. Both techniques allow rapid prototyping as well as high volume production of fully patterned substrates for a wide range of materials. This paper will present results on HE and UV-NIL, among them full wafer imprints up to 200 mm with high-resolution patterns down to nm range.