TiAl基合金的辉光离子渗氮试验

Plasma Nitridation Process of TiAl Based Allos

研究了TiAl基合金的辉光离子渗氮。渗氮气氛为NH3,渗氮温度分别为850℃、900℃、950℃,渗氮时间分别采用2h到12h不等。结果表明:TiAl基合金经辉光离子渗氮后,在表面形成由氮化物层和过渡层组成的氮化层,氮化层形成速度明显快于高温气体渗氮。采用NH3气氛、900℃×9h工艺参数时,渗层厚度可达12μm,渗层的显微硬度值可达1097HV0.1。

The plasma nitridation process of TiAl based alloys has been investigated.The experiment is carried out in a plasma nitriding unit,in which ammonia is full-filled,the 3 kinds of nitriding temperature are 850℃,900℃,950℃,and nitriding time is from 2 h to 12 h.Results show that the formed nitrogen scale consists of two layers,a nitride layer and a transition layer; its forming speed is higher more than that of high-temperature nitridation; and the nitrogen scale depth of specimen which handled in ammonia,900℃×9 h can achieve 12 μm, and its hardness can achieve 1097HV_(0.1).