纳米晶精密电铸层微观结构的测试与研究

Research on Microstructure of Nanocrystalling Nickel Electroforming Layers

采用高速冲液电铸装置、高频脉冲电流等方法 ,制备出金属镍纳米晶粒电铸沉积层。运用TEM、SEM和XRD等现代分析手段对纳米晶沉积层微观结构进行了分析研究。结果表明 ,沉积电流密度对细化沉积层晶粒有着重要影响。随着沉积层晶粒细化 ,横断面上晶粒生长从树枝状晶向细小等轴—柱状晶方式转变 ,在 ( 2 0 0 )晶面存在着明显择优生长取向。

The nickel electroforming layers with nanocrystalline (nc) were obtained by using high frequency pulse current and strong electrolyte flushing. The microstructure evolution of the nc Ni layer was examined by means of Transmission Electron Microscopy (TEM), Scanning Electron Microscopy (SEM) and X-ray Diffraction (XRD) . The results show that under proper deposition conditions, the current density has a strong impact on preparing dense and nc deposited layers. The crystal configuration converted from dendritic growth to micro equal-columnar growth, and crystal orientation possesses strong (200) texture with the decrease of the grain size. The effects of the grain sizes on internal strains were discussed.