热处理及SmCo磁性层对TbDyFe 薄膜磁致伸缩性能的影响

The Effect of a SmCo Layer and Annealing on the Magnetostricion of TbDyFe Thin Films

研究了SmCo薄膜的复合及热处理对TbDyFe薄膜磁性及磁致伸缩性能的影响。XRD分析表明制备态的TbDyFe薄膜为非晶态,在450℃退火后,样品仍保持非晶态结构。退火处理减少了薄膜的垂直各向异性,并且退火热应力有利于薄膜的易磁化轴转向膜面,从而提高了薄膜的磁导率和TbDyFe薄膜低场下的磁致伸缩值。磁控溅射的SmCo薄膜有良好的软磁性能,它的复合也能有效地增强TbDyFe薄膜的低场磁致伸缩性能。

The effects of a SmCo layer and vacuum annealing on the magnetic and magnetostrictive properties of TbDyFe thin films were investigated. X-ray diffraction shows that the microstructure of as-deposited TbDyFe film is amorphous, and no changes are discovered in the film after annealing at 450degreesC for I h. The magnetostriction tests reveal that the annealing treatment can significantly improve the magnetostrictive coefficient (lambda) and dlambda/dH of the TbDyFe thin films, especially in low magnetic fields. The addition of the SmCo layer greatly increases the magnetostriction of TbDyFe films.