摘要
In order to study the magnetic properties and structure of very thinpermalloy films, Ni_(81)Fe_(19) films of 12 nm in thickness were prepared by different instrumentsat an ultrahigh base vacuum and a lower base vacuum. The anisotropic magnetoresistance coefficients(ΔR/R) of Ni_(81)Fe_(19) (12 nm) films reached 1.6 % and 0.6 %, and the coercivities were 127 and334 A/m, respectively. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were usedto study the structure and surface chemical state. The experimental results show that the filmsprepared at the ultrahigh base vacuum have a smoother surface, a bigger grain size and a denserstructure with fewer defects than those prepared at the lower base vacuum.
In order to study the magnetic properties and structure of very thinpermalloy films, Ni_(81)Fe_(19) films of 12 nm in thickness were prepared by different instrumentsat an ultrahigh base vacuum and a lower base vacuum. The anisotropic magnetoresistance coefficients(ΔR/R) of Ni_(81)Fe_(19) (12 nm) films reached 1.6 % and 0.6 %, and the coercivities were 127 and334 A/m, respectively. X-ray photoelectron spectroscopy (XPS) and X-ray diffraction (XRD) were usedto study the structure and surface chemical state. The experimental results show that the filmsprepared at the ultrahigh base vacuum have a smoother surface, a bigger grain size and a denserstructure with fewer defects than those prepared at the lower base vacuum.
基金
This work was financially supported by the National Natural Science Foundation of China (No.50271007) and the Research Fund for the Doctoral Program of Higher Education of China (No.20030008003).
