半导体微结构物理效应及其应用讲座 第1讲 布拉格衍射效应在半导体光电子器件中的应用与发展

Application of bragg diffraction in the development of semiconductor opto-electronic devices

文章对布拉格衍射效应在半导体光电子材料和光电子器件 ,特别是在光纤通信中的光电子器件的应用和发展进行了详细的介绍 .文中以布拉格光栅衍射效应的光反馈和选模功能为主线 ,逐一介绍了X射线双晶布拉格衍射技术在半导体材料、特别是在量子阱和应变量子阱超薄层晶体生长和质量控制方面的作用 ,介绍了内建布拉格光栅对光通信用光信号源的发展所起的重要作用 ,波导光栅在复用和解复用过程中的作用 ,以及光纤布拉格光栅在全光纤通信系统中的应用及发展等 .

The important role of Bragg diffraction in the application and development of semiconductor opto\|electronic materials and devices is described. The function of the optical energy feedback and mode selection in Bragg diffraction is used as a key point to review the role of X\|ray double crystal diffraction for the growth and quality control of semiconductor materials, especially for multi\|quantum wells and strain multi\|quantum wells, the role of the inner Bragg grating for the development of the light signal source for optical fiber communicationsthe role of array waveguide gratings for the development of multiplexing and demultiplexing, and the role of fiber Bragg gratings for all\|optical fiber communications.