摘要
可溶性聚硅烷高分子(polysilane polymer)是80年代初期才发展起来的一种功能高分子,有关文献对于聚硅烷高分子的紫外光解及光刻作用有较详细的报道,然而有关它的光敏引发聚合作用则鲜有报道。我们研究了聚硅烷高分子对苯乙烯的光敏引发聚合作用及其特点,这对于开发一类新的高分子光敏剂有重要的意义。
This paper is based on the mechanism of UV photodecomposition of polysilane, utilizing the stlane free radical generated from the photodecomposition to initiate the polymerization of monomer styrene. Studies of the influences of initiating time, concentration of polysilane, and UV characteristic absorption wavelength (A? of polysilane on the percentage of polymerized conversion, show that polysilane can be characterized as photoinitiator. The percentage of conversion increases with the square root of the concentration of polysilane. The closer the λmax is to the wavelength of source light, the more effective the polymerization is.
出处
《高分子学报》
SCIE
CAS
CSCD
北大核心
1993年第3期348-351,共4页
Acta Polymerica Sinica
基金
江苏省科委资助项目(89277)
关键词
光敏繁合
苯乙烯
聚硅烷
高聚物
Polysilane Polymer, Photoinitiated Polymerization,Free radical Polymerization, Photoinitiator