双炔酸多层LB膜的光敏聚合研究

A Study of Sensitizing Photopolymerization of Diacetylene Acid in Langmuir-Blodgett Multilayers Film

选用(口恶)花菁染料为光敏剂,将其镶嵌到双炔酸LB膜中,利用Ar^+离子激光514.5 nm照射LB膜,观察到双炔酸LB膜的光敏聚合及(口恶)花菁染料荧光的猝灭,对其光敏聚合机理进行了讨论。

Tricosa-10,12- diynoic acid is a good Langmuir-Blodgett (LB) film material. It can polymerize under UV radiation. In order to extend the range of the sensitivity of diacetylene acid toward visible light, the cyanine dyes were used as sensitizers. It was embedded in the diacetylene acid mono-layers film. We found that when the films were irradiated by Ar+ laser at 514. 5 nm the diacetylene acids multilayers film polymerized and the fluorescence quench of cyanine dyes. Based on these results, the sensitizing photopolymerization mechanism was discussed.