期刊文献+

利用纳米硬度试验法确定Cr/Cu梯度材料的变形特性 被引量:1

Nanoindentation of Cr/Cu Functionally Graded Thin Films on Cu Substrates
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摘要 利用纳米硬度仪研究了在Cu基底上的Cu/Cr梯度膜的机械性能。梯度膜是通过将Cu靶和Cr靶同时溅射到Cu基底材料上,但两个靶的相对溅射功率随溅射时间变化而制备。利用Oliver and Pharr方法得到了膜随其厚度变化的硬度和弹性模量。然后利用加载/卸载/再加载的方法得到了在不同深度(即膜的厚度)压头平均压力与相对压入深度之间的关系曲线,在此曲线上可以明显反映出材料的屈服特性。 Hardness, elastic modulus and elasto-plastic deformation curves of a Cr/Cu functionally graded thin films on Cu substrates were investigated by nano-indentation experiments. Thin films are prepared by sputter deposition with Cr and Cu targets at room temperature. Hardness and elastic modulus dependence on the thickness of the thin film were obtained based on the Oliver and Pharr method. Deformation curves of the thin film, including elastic deformation portion and plastic deformation portion at a point loading have been determined. It is found that such deformation curves, and the hardness and elastic modulus dependence on the penetration depth of indenter, can be strongly correlated with variations of the composition and mechanical properties of the thin film with the thickness.
出处 《力学季刊》 CSCD 北大核心 2004年第3期382-385,共4页 Chinese Quarterly of Mechanics
基金 香港裘槎基金国家自然科学基金(10312071)资助
关键词 铬/铜梯度薄膜 纳米压痕 力学性能 变形 Cr/Cu functionally graded thin films nano-indentation mechanical properties deformation
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参考文献4

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  • 1周庆刚,白新德,陈小文,凌云汉,彭德全.氮化铬梯度膜的制备和电化学性能研究[J].稀有金属材料与工程,2004,33(6):666-669. 被引量:8
  • 2陈民芳.HA/Ti梯度薄膜材料的体外细胞相容性研究[J].天津理工大学学报,2005,21(1):25-28. 被引量:5
  • 3姜恩永,林川,刘裕光,孙多春,田民波.对向靶溅射氮化铁梯度薄膜[J].科学通报,1995,40(9):851-854. 被引量:1
  • 4Hu Yong Tian, Helen Lai Wa Chana, Chung Loong Choy, et. al. The effects of composition gradients of BaxSr1-xTiO3 thin films ontheir mierostruetures, dielectric and optical properties [ J]. Materials Science and Engineering ,2003, B103: 246 - 252.
  • 5Sonoda T, Kato M. Coating of Ti -6Al-4V Alloy Substrate of Ti/N Compositional Gradient Film by Reactive DC Sputte- ring[J]. Materials Research Bulletin, 1997, 32(7) :899 -905.
  • 6Sonoda T, Kato M. Formation of Ti/O compositional gradient film on Ti -6Al -4Valloy by reactive DC sputtering[ J]. Surface Science 1998, 402 - 404:241 - 244.
  • 7Govindarajan S, Moore a J J, Mishra B, et al. On the possibility of tailoring a compositional gradient in thin films sputtered from a MoSi2 + XSiC composite target [ J ]. Surface and Coatings Technology, 1996,86 - 87 : 33 - 40.
  • 8Cookea M D, Gibbsa M R J, Pettifer R F. Sputter deposition of compositional gradient magnetostrietive FeCo based thin films[J]. Journal of Magnetism and Magnetic Materials, 2001,237 : 175 - 180.
  • 9程晓农,宋娟,严学华.磁控溅射法制备ZrW_2O_8/Cu梯度薄膜[J].硅酸盐学报,2007,35(11):1514-1519. 被引量:9
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