摘要
Tantalum as an insulating barrier can take the place of Al in magnetic tunneljunctions (MTJs). Ta barriers in MTJs were fabricated by natural oxidation. X-ray photoelectronspectroscopy (XPS) was used to characterize the oxidation states of Ta barrier. The experimentalresults show that the chemical state of tantalum is pure Ta^(5+) and the thickness of the oxide is1.3 nm. The unoxidized Ta in the barrier may chemically reacted with NiFe layer which is usuallyused in MTJs to form an intermetallic compound, NiTa_2. A magnetic 'dead layer' could be produced inthe NiFe/Ta interface. The 'dead layer' is likely to influence the spinning electron transport andthe magnetoresistance effect.
Tantalum as an insulating barrier can take the place of Al in magnetic tunneljunctions (MTJs). Ta barriers in MTJs were fabricated by natural oxidation. X-ray photoelectronspectroscopy (XPS) was used to characterize the oxidation states of Ta barrier. The experimentalresults show that the chemical state of tantalum is pure Ta^(5+) and the thickness of the oxide is1.3 nm. The unoxidized Ta in the barrier may chemically reacted with NiFe layer which is usuallyused in MTJs to form an intermetallic compound, NiTa_2. A magnetic 'dead layer' could be produced inthe NiFe/Ta interface. The 'dead layer' is likely to influence the spinning electron transport andthe magnetoresistance effect.
基金
This work was financially supported by the National Natural Science Foundation of China and the Research Foundation for the Doctoral Program of Higher Education of China under Grant No.50271007 and 20030008003, respectively
