摘要
为了提高ICF精密制靶的质量,提出用微波等离子体(MP)技术,包括等离子体薄膜制备、等离子体反应性离子束刻蚀、聚焦离子束刻蚀、掺杂纳米金属粉末制备和掺杂纳米金属粉末的表面包覆改性等技术,去加以改进和解决。此方法与其它成膜技术相结合,在ICF精密制靶中得到广泛应用。
This paper mainly discusses the application of microwave plasma technology in the field of the inertial confinement fusion(ICF) target fabrication, including films preparation, reactive ion beam etching(RIBE) and focused ion beam(FIB) etching, as well as the nano-metal particles synthesis and its surface polymer-coated modification. This technology is very useful to solve the problem occurred in ICF target fabrication and improve the quality of the ICF target produced.
出处
《强激光与粒子束》
EI
CAS
CSCD
北大核心
2004年第8期1025-1028,共4页
High Power Laser and Particle Beams
基金
国家自然科学基金资助课题(10075040)
