期刊文献+

灰度掩模制作系统掩模图形的生成及工艺研究 被引量:2

Manufacturing system for gray-scale masks’ mask patterns’ making and technique study
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摘要 灰度掩模法是目前正在积极探索的一种二元光学器件制作方法。从基于空间光调制器的灰度掩模制作方法出发 ,就“掩模图形的生成”和“工艺”这两个难点问题进行了深入的研究 ,并具体地制作了几种常用的二元光学器件的灰度掩模 。 Gray-scale mask method is an active groping facture idea of binary optics at present.For more utility,some difficult questions such as mask patterns’ making and technique are being studied in-depth based on the manufacturing method for gray-scale masks using special light modulator.At the same time,some gray-scale masks of normal binary optical elements have been actually fabricated.
出处 《激光技术》 CAS CSCD 北大核心 2004年第4期406-409,共4页 Laser Technology
基金 国家自然科学基金资助项目 (5 0 0 0 5 0 2 2 )
关键词 空间光调制器 灰度掩模 工艺 二元光学 spatial light modulator gray-scale mask manufacture technics binary optics
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参考文献5

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二级参考文献8

  • 1颜树华,戴一帆,吕海宝,李圣怡.二元光学器件激光直写技术的研究进展[J].半导体光电,2002,23(3):159-162. 被引量:7
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共引文献11

同被引文献15

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二级引证文献15

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