摘要
分步投影光刻设备对准系统是由嵌在工作台上的一组基准标记、一套离轴对准系统和一套掩模对准系统组成。当工作台上的基准标记运行到投影镜头下面时,通过掩模对准系统在预定范围内扫描测量标记位置值。当工作台上的基准标记或硅片上的标记运行到离轴对准系统测量光束下面时,用系统扫描可以测量出标记的坐标值。即可通过测量值计算出每个曝光场的中心坐标值。通过EGA对准数据,可计算出硅片的平移偏移量、旋转量、比例量和正交性量的补偿值。
An alignment system of step exposure apparatus comprises a group fiducial on wafer stage ? an off-axis alignment module and reticle alignment module. When a fiducial mark on the wafer stage is positioned directly under the projection lens , a presetting is performed so that measuring value by the reticle alignment module .when a fiducial mark on the wafer stage or a mark on the wafer is positioned directly under the off-axis alignment center ,the coordinates of the mark can be obtained. The center coordinates of each shot can be calculate by the alignment value .Through the EGA alignment data , the offset, rotation, scaling and orthogonal of wafer can be corrected.
出处
《电子工业专用设备》
2004年第9期58-62,共5页
Equipment for Electronic Products Manufacturing
