摘要
本文着重介绍了国外一些微电子设备,包括光刻设备和掩模缺陷修补设备,以及集成光学的发展动态,并对当前出现的一些新技术及光刻技术的前景作了微略的探讨。
The development of some microelectronics equipment, including optical mi-
crolithography and photomask defect repair equipment,and integrated optics are described in
the paper. Some new technologies and prospect of photolithography are briefly described.
出处
《光电工程》
CAS
CSCD
1993年第6期54-63,共10页
Opto-Electronic Engineering
关键词
光刻机
激光
集成光学
微细加工
Photolithography, Photolithographic systems, Laser repair, Integrated optics, Inspection tour reports.
