摘要
本文先扼要回顾电子技术的进展历程,从晶体管至微电子集成电路,并引伸至光电子器件,近来又有倾向从微米尺度缩小至纳米尺度,即从微电子技术向纳电子技术进化。文中估测大规模集成电路发展遇到的极限,又说明光电子器件激光管和开关管及集成的现状和趋向,以及超级计算机硅和砷化镓集成芯片的现状和推测。最后,简单叙述微加工技术现状和纳加工技术的开端,包括薄膜形成、版图制备、刻蚀工艺和测试仪器等技术,从而看出纳电子技术有可能开始起步。
This paper briefly recollects the progress of electronic technology, passing from discrete transistors to microelectronic integrated circuits, extending to optoelectronic devices, and recently advancing from micrometer scale to nanometer scale, showing the tendency of evolution from microelectronics to nanoelectronics. Then, the paper estimates the ultimate limit of large scale integrated cricuits, and reviews the present status and development trends of optoelectronic lasers, switching devices, and integration, as well as those of Si and GaAs chips of supercomputer. Finally, it describes briefly the microfabrication technology, including the deposition and epitaxy, pattern and mask, lithography and etching, and measuring instruments, thereby indicates the possible beginning of nanofabrication technology.
出处
《光通信技术》
CSCD
1993年第3期129-136,共8页
Optical Communication Technology
关键词
微电子技术
纳电子技术
光电子器件
Microelectronics
Nanoelectronics
Nanometer scale science and technology
Large scale integrated circuits
Optoelectronic devices Molecular electronic devices