用于衍射光学元件优化设计的遗传算法及其与模拟退火算法的比较

Genetic algorithm to the optimal design of diffractive optical elements and its comparison with simulated annealing algorithm

本文成功地将遗传算法运用于高维衍射位相光学元件的优化设计.并与模拟退火算法进行了比较.结果表明,该算法不仅对于二元,而且对于多元位相光学元件的优化疫计均是十分有效的.而且,它特别适用于利用光电混合处理系统进行优化计算.

In this paper we successfully apply the modified genetic algorithm to the optimal design of diffractive phase optical elements with high demension. Its comparison to simulated annealing algorithm is also discussed. The results show that genetic algorithm not only can be applied to the optimal design of diffractive optical element with ninary phase, also with the multi-level phase. Especially, it suits to implement in an optoelectronic hybrid system.