摘要
分析了永久性光谱烧孔(PHB)材料成孔量子效率的测量原理,建立了相应的测试方法和装置.在液氦温度(4.2K)下对聚合物基质PMMA(聚甲基丙烯酸甲酯)中掺杂5,10,15,20-四-对羟基苯基卟吩(THP)体系的成孔量子效率进行了测量计算.
Theory and method for the determination of quantum efficiency for photochemical hole buring ( PHB ) are given in detail. For the organic impurity center tetrahydroxyphenylporphin (THP) imbedded in poly (methylmethacrylate) (PMMA) amorphous matrix, the quantum efficiency is calculated according to the parameters measured at liquid helium temperature. Integrated absorption coefficient instead of dipole moment is used in the calculation.
出处
《光学学报》
EI
CAS
CSCD
北大核心
1993年第12期1133-1138,共6页
Acta Optica Sinica
关键词
永久性
光谱烧孔
量子效率
photochemical hole burning, quantum efficiency, impurity center,integrated absorption coefficient.
