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集成化NMOS核心工艺参数的Taurus Workbench优化

The Taurus Workbench optimization of the integration n-channel MOS core technic parameter
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摘要 介绍了集成电路TCAD虚拟工厂系统Taurus Workbench,基于CMOS工艺的特点,在TaurusWorkbench环境下进行了深亚微米级n沟器件的核心参数优化。优化结果印证了新的工艺条件对器件特性的改善。 The integrated circuit TCAD virtual factory system Taurus Workbench is introduced. Based on process characteristics of CMOS,optimization of key core parameters for deep submicron n-channel MOS devices with the Taurus Workbench is discussed. Results from the experiments show that the new process conditions help to improve the device performance.
出处 《微纳电子技术》 CAS 2004年第9期44-48,共5页 Micronanoelectronic Technology
关键词 超大规模集成电路 超深亚微米 仿真 优化 VLSI VDSM simulation optimum
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