磁约束电感耦合等离子体增强反应溅射沉积nc-TiN/a-Si_3N_4纳米复合薄膜

Reactive Sputter Deposition of nc-TiN/a-Si_3N_4 Nanocomposite Films in a Magnetized Inductively Coupled Plasma

介绍一种新型磁束缚电感耦合等离子体增强的物理化学气相沉积复合系统,并用该系统通过反应磁控溅射TiSi合金靶,在氩气和氮气等离子体作用下,在单晶硅衬底上制备了nc-TiN/a-Si3N4纳米复合薄膜.扫描电子显微镜、X射线衍射仪、X射线光电子谱仪和高分辨率透射电子显微镜的分析和观察结果清晰地表明该薄膜是具有纳米结构的复合薄膜,主要由镶嵌在非晶态Si3N4基体中的TiN纳米晶粒组成,TiN晶粒的尺寸约为3nm.

A novel magnetized plasma CVD and PVD combined technique was developed aiming at synthesizing nanocomposite films. The nanocrystalline nc-TiN/amorphous a-Si3N4 nanocomposite film was satisfactorily fabricated onto silicon wafer substrates by reactively sputtering a TiSi alloyed target in a magnetized inductively coupled radio-frequency argon/nitrogen plasma. Scanning electron microscopy (SEM), X-ray diffractometry (XRD), X-ray photoelectron spectroscopy (XPS) and high-resolution transmission electron microscopy (HRTEM) were utilized to characterize the film structurally and compositionally. XRD, XPS and HRTEM investigations evidently revealed that the film was nanocomposite consisting basically of similar to3nm TiN nanocrystallites in an amorphous Si3N4 matrix.