摘要
利用俄罗斯科学院研制的CVD (Chemicalvapordeposition)软件计算分析了CH4 H2 S体系在 10 132 5Pa、90 0~ 130 0K ,CO H2 S体系在 10 132 5Pa、90 0~ 12 0 0K下不同硫添加物含量及温度对碳沉积率的影响 ;绘制了碳沉积边界曲线 ,预测了碳沉积区 ;计算筛选出了适合于不同体系制备碳纳米管的催化剂。
The influences of the different amounts of sulfur additive and the reaction temperature on the ratio of the deposited carbon in the CH 4-H 2S system at 101325Pa, 900~1300K and CO-H 2S system at 101325Pa, 900~1200K have been calculated and analyzed by use of the CVD (chemical vapor deposition) software invented by the scientists of Russia Academy of Science. Curves of the phase boundary of carbon deposition have been drawn. Carbon deposition areas were predicted. Catalysts suitable for the preparation of carbon nanotubes in different systems were checked and selected by calculation. Adding sulfur additive could improve the ratio of carbon nanotubes deposition was proved.
出处
《化工新型材料》
CAS
CSCD
2004年第7期36-38,42,共4页
New Chemical Materials