电沉积结晶形态研究进展

Advancement in Electrodepositing Crystalline Formation

电沉积金属膜层的物理、化学性质以及力学性能与其组织结构密切相关 ,而沉积金属膜层的组织结构受诸多电沉积工艺条件的影响。为此 ,综述了近年来关于基体材料、沉积金属类型、过电位、表面活性剂等对镀层结晶形态影响的研究成果。介绍了沉积金属结晶过程中的过电位和晶粒尺寸、基体材料种类以及沉积膜层厚度增加对沉积组织的影响和溶液中表面活性剂对形核自由能、位错密度。

Physical,chemical and mechanical characteristics of metal electrodepositing film depend on its structure and organization,which are influenced by many factors.The recent research findings were reviewed on the influence factors of plating crystalline formation.The effects of overpotential,grain size,substrate metal classes and thickness increase of deposit on the organization of film were introduced as well as the influences of surfactant on the free energy of nuclear formation,dislocation density and microstructure of deposit.