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X射线光电子能谱技术在高分子材料摩擦化学研究中的应用 被引量：2

Application of XPS Technology in Polymer Tribochemical Study
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摘要 X射线光电子能谱技术(XPS)是材料表面分析的重要手段,其近年的快速发展促进了表面化学领域研究的深入.高分子及其复合材料在摩擦学性能方面具有普遍的优势,通过XPS对高分子及其复合材料摩擦表面的分析,可以确定摩擦过程的化学变化,并对改进材料的摩擦学性能起到理论的指导作用.作者主要介绍XPS技术的基本原理,及其在高分子与复合材料摩擦学性能研究中的应用. In this paper, the XPS technology was introduced in detail, at the same time the application of XPS in tribochemical study was reviewed. For XPS is an important surface analysis technology, its application in tribology field will become more and more important.
作者 石光 章明秋 容敏智 Klaus Friedrich
机构地区 华南师范大学化学系 中山大学材料科学研究所聚合物复合材料及功能材料教育部重点实验室 InstituteforCompositeMaterials
出处 《化学研究》 CAS 2004年第3期76-80,共5页 Chemical Research
基金 德国大众基金会项目(VW StiftungNo.1/76645) 国家自然科学基金项目(50133020).
关键词 X射线光电子能谱技术 高分子材料 摩擦性能 表面化学 技术原理 XPS binding energy tribochemical polymer material.
分类号 TB324 [一般工业技术—材料科学与工程]
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参考文献16

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同被引文献21

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化学研究
2004年 第3期

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