热压印刻蚀技术

Hot embossing lithography

纳米压印刻蚀技术是通过压模的方法实现纳米结构批量复制的。这一技术具有高分辨、高效率和低成本的优点。它与现行的光学刻蚀技术流程相似,具有较好的兼容性与继承性。详细介绍了热压印刻蚀技术的核心工艺步骤:压印模板的制备、热压印胶的选择、压模和撤模、反应离子刻蚀以及热压印过程中的聚合物流动机理,探讨了热压印刻蚀技术中的基础科学问题。还分析了纳米压印刻蚀技术的研究现状,展望了纳米压印刻蚀技术的应用前景。

Nanoimprint Lithography(NIL)is a new technique to mass replicate nanostructure by molding. The main advantages expected in NIL are high resolution,high throughput and low system cost. In addition,NIL is well compatible and inheritable to the conventional photolithography technique because their processes are similar. This paper reviews the details of the key process in hot embossing lithography:fabrication of imprinted mold,selection of resist,pressing mold and remolding process,Reactive Ion Etching and flow behavior in hot embossing lithography. It discusses the basic problems of the state-of-the-art lithography. Furthermore,a survey of the current status and application potential of NIL is given.