铱金属及其氧化物薄膜的制备与应用研究进展

Recent Progress in Preparation and Application for Iridium/Oxide Films

铱及其氧化铱薄膜具有优良的耐腐蚀、抗氧化特性 ,同时也具有极好的电化学特性 ,这使它在电学、抗氧化涂层、催化领域都有广泛的应用。综述了近年来有关金属铱及其氧化铱薄膜的合成与制备技术的一些最新进展。总的来看 ,制备方法可分为物理法和化学法。其中物理法包括溅射法、激光熔蒸法 ;化学法包括金属有机化学沉积法、热分解法、电化学沉积法、溶胶凝胶法等 ,对各种制备方法进行了评述 ,同时对铱及其氧化铱薄膜的应用领域进行了综述 。

The iridium/oxide films are widely used in the electronics, oxidation resistant coating and catalysis fields because of theirs anti corrosion, oxidation resistant and superior electrochemistry performances. In this paper, various preparation methods, which can be used to obtain iridium/oxide films, were reviewed. For example, sputtering method, pulsed laser ablation, metal organic chemical vapor deposition, thermal decomposition, electrodeposition, sol gel method, and so on. The applications of iridium/oxide films were also discussed, and the future progress in synthesis of iridium/oxide films was prospected.