摘要
回顾了光刻对准技术的发展功能,对各种对准方法的原理和特点进行了分析和评价,介绍了几种典型主流光刻对准系统结构形式,并对光刻对准技术前景进行了描述与展望。
The development of alignment techniques has been reviewed. Some kinds of alignment principle are summarized and some typical alignment systems for lithography have been introduced and analyzed in detail .It is come to the conclusion that many high accuracy mask-to-wafer alignment systems will have been achieved soon.
出处
《电子工业专用设备》
2004年第10期30-34,共5页
Equipment for Electronic Products Manufacturing
基金
微细加工光学技术国家重点实验室基金资助
