摘要
下一代光刻技术是指≤32nm工艺节点的光刻技术。介绍了下一代光刻技术与设备,包括X射线光刻技术、极紫外线光刻技术和纳米压印光刻技术等。
The next generation lithography is the lithography technology of the ≤32 nm technology node. In this paper, the next generation lithography and equipment are introduced, consist of the x-ray lithography, the extreme ultraviolet lithography, the nanoimprint lithography and so on.
出处
《电子工业专用设备》
2004年第10期35-38,共4页
Equipment for Electronic Products Manufacturing
