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低能量He离子注入局域寿命控制LIGBT的实验研究(英文) 被引量:3

Numerical and Experimental Study of Localized Lifetime Control LIGBT by High Dose He Ion Implantation
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摘要 提出了一种采用低能量大剂量 He离子注入局域寿命控制的高速 L IGBT,并对其进行了实验研究 .粒子辐照实验结果显示与常规的 L IGBT相比较 ,该器件的关断时间和正向压降的折中关系得到了改善 .同时研究了当局域寿命控制区位于 p+ - n结附近 ,甚至在 p+阳极内时 ,该器件的正向压降和关断时间 .结果显示当局域寿命控制区在p+ 阳极内时 。 A high speed LIGBT with localized lifetime control by using high dose and low en ergy helium implantation(LC-LIGBT) is proposed.Compared with conventional LIGB Ts,particle irradiation results show that trade-off relationship between turn- off time and forward voltage drop is improved.At the same time,the forward volta ge drop and turn-off time of such device are researched,when localized lifetime control region place near the p+-n junction,even in p+ anode.The results s how for the first time,helium ions,which stop in the p+ anode,also contribute to the forward voltage drop increasing and turn-off time reducing.
出处 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2004年第9期1048-1054,共7页 半导体学报(英文版)
关键词 LIGBT 局域寿命控制 He离子注入 LIGBT localized lifetime control helium ion implantation
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参考文献11

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同被引文献10

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  • 9方健,李肇基,李鸿雁,杨健.低能He注入局域寿命控制电导调制型功率器件输运模型[J].电子学报,2001,29(8):1072-1075. 被引量:3
  • 10贺朝会,耿斌,杨海亮,陈晓华,李国政,王燕萍.浮栅ROM器件辐射效应机理分析[J].物理学报,2003,52(9):2235-2238. 被引量:11

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