用迈克尔逊干涉仪测量纳米级薄膜厚度的研究

Reaserching on the Messured Nanometer Level Film Thickness with Michelson' s Interferometer

通过实验,介绍了如何利用波动光学原理和迈克尔逊干涉仪测量纳米膜厚度,为纳米技术和纳米材料的研究打开了新思路,提供了新方法.

In this paper,authors present that how to apply undulatory theory of light to measure nanometer film thickness by used Michelson' s interferometer. It will supply a new method in the research field of nanometer technical materials.