CVD金刚石厚膜的机械抛光及其残余应力的分析

Study on Mechanical Polishing for CVD Diamond Thick Film and Its Residual Stresses

较粗糙的表面是影响金刚石厚膜广泛使用的因素之一。本文对CVD金刚石厚膜进行了机械抛光的正交实验研究。实验结果表明 ,影响抛光效率的因素依次为抛光盘的磨粒、转速、正压力和抛光面积。采用较大粒度的磨盘 ,适当增加转速和压力有利于提高抛光的效率。此外用XRD方法对机械抛光前后的膜的残余应力进行了测定和对比分析 ,结果表明 ,经过机械抛光 ,残余拉应力明显减小。

Rough surface is the obstacle to the application of diamond film. In this paper, orthogonal polishing experiment was designed and the surface roughness was measured to optimize the mechanical polishing parameters for high-efficiency polishing of the diamond film, using self-made mechanical polishing equipment. Experiment results indicate that the factors affecting the polishing efficiency are millstones granularity, speed, pressure and the area. The residual stresses of the diamond film before and after mechanical polishing were measured by X-ray method. The result and analysis indicate mechanical polishing is propitious to reduce the residual tensile stresses.