摘要
介绍了一种用于离子束辅助沉积光学薄膜的端部霍尔离子源的工作原理,并论述了端部霍尔离子源的离子能量、离子分布特性的测试方法;详细论述了电磁场和永久磁场两种模式下,端部霍尔离子源的工作稳定性、离子能量大小以及离子束分布特性的比较。
End-Hall ion source has been successfully developed for optical thin film coating by ion beam-assisted deposition (IBAD). Its operating principle and methods to test ion beam characteristics are introduced. Two patterns of end-Hall ion source using electromagnet coil or permanent magnet are comparatively analysed for ion energy and distribution.
出处
《真空》
CAS
北大核心
2004年第5期38-41,共4页
Vacuum
关键词
离子束辅助镀膜
端部霍尔离子源
电磁场
永久磁场
ion beam-assisted deposition (IBAD)
end-Hall ion source
electromagnetic field
permanent magnetic field
