残余氧对TiN+Si_3N_4纳米复合薄膜硬度的影响

IMPACT OF RESIDUAL OXYGEN ON HARDNESS OF NANO STRUCTURED TiN+Si3N4 FILM

用直流等离子体增强化学气相沉积设备在不锈钢表面沉积纳米晶TiN和纳米非晶Si3N4复相薄膜.主要研究了氧元素对薄膜硬度的影响.结果表明,薄膜中极其微量的氧含量就会使nc-TiN+a-Si3N4薄膜的硬度大幅降低.薄膜中氧含量小于0.2％(原子分数),薄膜硬度可以达到45-55 GPa,而氧含量升至1％-1.5％后,薄膜硬度降至30 GPa左右.其原因与晶界处形成SiOx相有关.

Using direct current plasma enhanced chemical vapor deposition (PCVD) techniques, the nanocomposite films of nc-TiN + a-Si3N4 were synthesized. The detrimental effects of residual oxygen on the films hardness were explored. A minor content of residual oxygen can strongly decrease the hardness of the superhard film. Oxygen impurity of 1%-1.5% (atomic fraction) can make the hardness of film decrease to about 30 GPa as compared to 45-55 GPa for the film with below 0.2% oxygen, which is related to the formation of SiOx at interface of crystalline.