期刊文献+

用软刻蚀方法制备PbS纳米晶复合聚丙烯酸微图形 被引量:2

Preperation of PbS/poly(acrylic acid) Nanocrystal Micropatterns by Soft Lithography
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摘要 利用软刻蚀方法制备了包裹有硫化铅纳米颗粒的聚丙烯酸微图形 .首先通过毛细微模塑法制备了丙烯酸铅的微条纹 ,并使之在γ射线引发下固态聚合 ,最后用硫化钠溶液处理聚合物微条纹 ,将铅离子转化为包埋在聚合物体系中的硫化铅颗粒 ,得到了包裹有硫化铅纳米颗粒的高清晰度的聚丙烯酸微图形 .利用X射线衍射(XRD)、X射线光电子能谱仪 (XPS)、透射电镜 (TEM)对其结构和性质进行了表征 .结果表明包埋在聚合物体系中的PbS颗粒直径小于 2 0nm . s PbS microstructures have several applications such as Pb 2+ ion-selective sensors and IR detector. The method to prepare PbS nano crystal embed in poly(acrylic acid) (PAA) microstructures produced by means of soft lithography and solid state polymerization by γ-ray irradiation was described. PbS micropatterns were prepared by Micromolding in Capillaries(MIMIC) with aqueous solution of acrylic acid lead monomer, and then solid state polymerized by γ-ray irradiation. Finally, the sample was treated with aqueous solution of Na 2S to convert the Pb 2+to PbS in the matrix. High-resolution microstructures of PAA, which have PbS nanocrystals embedded in them, could be produced successfully in this way. The final products were characterized by TEM, XRD, and XPS. TEM image indicated that the PbS particles embedded in PAA had a diameter of smaller than 20 nm. X-ray powder diffraction method was also used to characterizethe PbS/PAA nanocomposite film. The XPS analysis showed the element Pb has been converted to PbS nanoparticles in the composite films.
出处 《Chinese Journal of Chemical Physics》 SCIE CAS CSCD 北大核心 2004年第5期641-644,共4页 化学物理学报(英文)
基金 ProjectsupportedbytheNationalNaturalScienceFoundationofChina (2 0 174 0 38)
关键词 硫化铅 聚丙烯酸 毛细微模塑 纳米复合材料 PbS, Poly(acrylic acid), Micromolding in capillaries, Nanocomposite
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参考文献18

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