直流电弧等离子体射流CVD制备多种碳膜

CARBON FILMS PREPARED BY D. C. ARC PLASMA JET CVD

本文报道了在同一直流电弧等离子体射流CVD装置上,采用不同的沉积条件高速合成金刚石、类金刚石、高取向热解石墨以及无定形碳等四种碳膜.经X射线衍射(XRD)、拉曼散射谱(Raman)、扫描电镜(SEM)形貌分析以及显徽硬度测试表明,该方法制得的金刚石膜和高取向热解石墨膜具有很高的纯度和良好的晶性,类金刚石膜具有独特的形貌和Raman散射特征以及可与金刚石膜比拟的硬度。

Four kinds of carbon films namely the diamond, diamond-like (DLF), highly oriented pyrolytic graphite (HOPG) and glassy carbon (GO films were synthesized with high growth rate in a D. C. are plasma jet CVD apparatus. The products were characterized and evaluated by X-ray diffraction,Raman scattering,SEM morphology and micro-hardness tests,Diamond films and HOPG films synthesized using this method possess highly preferred orientation as well as good crystallization,the DLF has unique morphological features and Raman spectrum characteristics,and its micro-hardness could compare with that of diamond films.