摘要
用110 keV Fe^(1+)离子束对小麦种子进行注入处理,以扫描电镜-X射线能谱分析法测定Fe^(1+)离子的注入深度。测定结果表明:Fe^(1+)离子虽已进入种皮,但未达到胚部,最大注入深度为72μm。
The wheat seeds were implanted with Fe1+ low energy heavy ions which were produced by 200 keV implantation ion installation at Institute of Modern Physics,Lanzhou.The implantation depth of Fe1+ ion was determined by means of a scanning microscope energy dispersive analysis of X-ray (SEM-EDAX).The analysis in this experiment showed that the implantation depth of Fe1+ ions was not more than 72μm,the ions stayed only in seed surface layer.
出处
《核农学报》
CAS
CSCD
1993年第4期198-202,共5页
Journal of Nuclear Agricultural Sciences
基金
国家自然科学基金