双折射型晶体Interleaver公差分析的优化设计

Tolerance Optimization in Birefringent Crystal Interleaver

该文提出用于16波分双折射型晶体interleaver公差分析的优化设计方法.在此种器件加工过程中,对晶体的长度以及方位角都要给定一个合理的公差范围.基于这个要求,作者采用蒙特卡洛(MonteCarlo)方法,编制了一整套计算机程序去仿真在晶体加工过程中尺寸公差对器件性能的影响,并通过仿真找出最佳晶体长度和方位角的公差范围.仿真结果表明,当晶体长度和方位角公差分别为1.0μm和0.5°时可实现优化设计.

Optimization of tolerance in birefringent crystal interleaver used in a 16-channal DWDM system is studied in this paper. It is essential to designate a reasonable tolerance for the crystal's length and azimuth in the manufacturing process. Based on this requirement, a set of programs is developed using the Monte Carlo method to find an optimal dimensional tolerance for the crystals. The simulation results show that an optimal design is achievable when the tolerance of length and azimuth is about (1.0 μm and 0.5°.)