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用制备的纳米氧化铜直接合成三乙氧基硅烷的研究 被引量:17

Nanosized Copper(Ⅱ) Oxide Catalyst Precursors for the Direct Synthesis of Triethoxysilane
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摘要 合成了纳米氧化铜催化剂并进行了表征,对催化剂在溶剂中以硅粉与气态乙醇反应合成三乙氧基硅烷进行了研究,讨论了反应温度、催化剂用量、硅粉粒度、不同溶剂对反应的影响.并与CuCl催化剂进行了比较. The process of the direct synthesis triethoxysilane via silicon-gas-ethanol and nanosized copper(Ⅱ)oxide in solvent was studied. The effect factors to reaction such as reaction temperature, the amount of CuO, silicon granularity, influences the solvent were discussed. The reaction results were compared with CuCl in the direct synthesis of triethoxysilane.
出处 《分子催化》 EI CAS CSCD 北大核心 2004年第5期361-365,共5页 Journal of Molecular Catalysis(China)
关键词 纳米 氧化铜 直接合成 三乙氧基硅烷 Nanosized copper(Ⅱ)oxide The direct synthesis Triethoxysilane
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  • 1[2]Nakanishi K, Minakuchi H, Soga N. J. Sol.-Gel.Sci. Tech. [J], 1997, 8: 547~552
  • 2[3]Xin Li-jing(井新利),Mao Sheng-zheng(郑茂盛),Zhi Hao-jin(金志浩),et al. Poly.Mater.Sci.Eng.[J],1998,14(4):62~64
  • 3[4]Suratwal T, Davidson K, Davidson Z, et al. J. Sol. -Gel. Sci. Tech. [J], 1998, 13:553~558
  • 4[6]Liu xui-fang, li wei-ping, lu xue-ran et al. Chin.Chen. Lett. [J], 1992, 3:358
  • 5[7]Takahiro G, Manabu O, Yoshimoto A. J. Sol.-Gel.Sci. Tech. [J], 2001, 22: 219~224
  • 6[10]Standke B, Frings A, Horn M, et al. US 5527937[P], un 18, 1996
  • 7[12]Mendieino, Frank, D; Childress, US 5, 783, 720[P], July 21, 1998
  • 8[13]Lewis, Kenriek M; Yu, Hua. US Patent, 5, 728,858[P], March 17, 1998
  • 9[14]Harada, Katsuyoshi; Yamada, Yoshinori [P], US Patent US5362897 , november 8, 1994
  • 10[16]Cho, Tsurahide; Ohta, Yoshiro. US Patent, 5,103034[P], April 7, 1992

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