摘要
采用多弧离子镀的方法在Ti 50.6%(原子分数)Ni形状记忆合金表面沉积了钽镀层。通过X射线光电子能谱(XPS)剖面分析发现TiNi合金表面钽镀层厚度均匀,并且在镀层与基体之间形成一薄层过渡层。将镀钽TiNi合金曝露于空气中后,通过XPS的全谱和高分辨谱图对其表面的成分和价态分析发现,镀钽层表面由于钽在空气中自然氧化形成了一层很薄的钽的氧化膜,最表面为高价钽的氧化物(Ta2O5),次表面为低价钽氧化物的混合物TaO2、TaO和TaOx(x<1)。
Tantalum coating was obtained on the surface of Ti-50.6at%Ni shape memory alloy by multi-arc ion plating method. The depth profile was investigated by X-ray photoelectron spectroscopy (XPS): it was found that a uniform tantalum coating was formed on the TiNi alloy with little interfere between TiNi substrate and tantalum coating. The surface chemical composition and chemical state of the tantalum coating were also investigated XPS survey and high resolution spectra. A thin oxide film with Ta2O5 in the outmost layer and tantalum suboxides in the inner layer, were formed on the surface of tantalum coating as a result of natural oxidation of Ta in atmosphere.
出处
《功能材料》
EI
CAS
CSCD
北大核心
2004年第5期558-559,562,共3页
Journal of Functional Materials
关键词
TINI形状记忆合金
多弧离子镀
钽
镀层
Annealing
Coatings
High resolution electron microscopy
Microstructure
Oxidation
Substrates
Titanium alloys
Titanium plating
X ray photoelectron spectroscopy
