摘要
用15keVAr+和N+注入纯PES膜和掺碘PES膜,掺碘PES样品离子注入后的介电谱表明,随注入剂量的增加,损耗峰移向高频,损耗峰的高度下降。离子注入纯PES膜的介电损耗在(0~10)MHz内小于0.062,没有松驰特性,是制作布线的理想材料。红外光谱表明,离子注入引起PES膜结构变化。
ure PES film and iodine doped PES film implanted with 15keV nitroge and argon ions. Dielectric frequency spctra of iodine doped PES film after implanting shows frequency of dielectric loss peak decreases with the increasing of implanted ion dose. Dielectric loss of ion implanted pure PES film is less than 0062 within (0~10)MHz and without relaxation characteristic.Pure PES film is ideal material for making connecting line.Infrared spectra of iodine doped PES film before and after implantation suggest that the structure of implanted PES film have changed .
出处
《宝鸡文理学院学报(自然科学版)》
CAS
1998年第3期22-27,共6页
Journal of Baoji University of Arts and Sciences(Natural Science Edition)
关键词
介电损耗
红外光谱
离子注入
Dielectric loss Infrared spectra Ion implantation