ZrO_2薄膜的力学性能和摩擦学性能研究

Mechanical Properties and Tribological Behaviour of ZrO_2 Thin Films

在单晶硅表面成功地获得了自组装单层薄膜 (MPTS SAM) ,并将薄膜表面的巯基 ( SH)完全氧化成磺酸基 ( SO3H) ,从而获得了磺酸化的MPTS SAM。采用静电自组装技术成功使ZrO2 纳米微粒组装到磺酸化的MPTS SAM表面获得淀积ZrO2 薄膜。将ZrO2 薄膜分别在 5 0 0°C和 80 0°C进行热处理后 ,ZrO2 薄膜的厚度逐渐减小 ,这可能是随着温度的升高薄膜的表面密度逐渐增大所致。对ZrO2 薄膜的力学和抗划伤性能分析发现 :随着温度的升高 ,ZrO2 薄膜的硬度和弹性模量依次增加 ,同时薄膜的抗划伤性能也逐渐提高。摩擦磨损实验表明 :利用该方法制备的ZrO2 薄膜经 80 0°C烧结处理后适于在低负荷、低滑动速度下作为减摩、抗磨保护性涂层。

ZrO 2 thin films were deposited on the sulfonated 3-mercaptopropyltrimethoxysilane self-assembled monolayer (MPTS-SAM) by the way of the enhanced hydrolysis of aqueous zirconium sulfate (Zr(SO 4) 2·4H 2O) in the presence of aqueous HCl at 50 °C , making use of the chemisorption ability of the -SO 3H group. The mechanical properties, adhesion strength and macro-friction and wear behaviors of the ZrO 2 films were determined by a NanoindentationⅡ(MET) test instrument and a UMT-2MT friction and wear test system, respectively. As the results, the ZrO 2 film annealed at 800 °C has a very much high hardness to elastic modulus (H/E) value (0.062) as compared to the as-deposited ZrO 2 film and the film annealed at 500 °C . The ZrO 2 films annealed at 800 °C show excellent wear-resistance as they slide against AISI-52100 steel at a normal load 0.5N.