摘要
研究了膜厚对WO3薄膜的电致变色特性的影响。WO3电致变色薄膜采用真空电子束蒸发技术制备,采用光学膜厚极值法和石英晶体振荡法膜厚测量技术监控WO3薄膜的膜厚及其光学特性。对不同光学膜厚的WO3薄膜的初始态、着色态和退色态的光谱特性进行了对比,同时研究了透射比和电流的时间响应特性。
The electrochromic characters of WO_(3 )films with different film thickness have been studied. The WO_(3 )electrochromic film was prepared using electron beam evaporation. The thickness and optical characters of WO_(3 )films were controlled by the extremum method of optical film thickness measure technology and the method of crystal oscillation thickness measure technology. The spectrum characters of asdeposited、bleached and colored WO_(3 )films with different film thickness were contrasted, the time response characters of spectral transmittance and current were also studied.
出处
《太阳能学报》
EI
CAS
CSCD
北大核心
2004年第5期647-650,共4页
Acta Energiae Solaris Sinica
关键词
WO3薄膜
膜厚
电致变色
WO_(3)film
film thickness
electrochromism