制备WO_3电致变色薄膜的低压反应离子镀工艺研究

Growth of WO_3 Electrochromic Films by Low Voltage Reactive Ion Plating

在电子束蒸发镀膜的基础上 ,引入低压反应离子镀工艺制备WO3 电致变色薄膜 ,研究不同氧分压对WO3 薄膜电致变色特性的影响 ,实验结果表明制备时选择工作气体氩气分压为 2× 10 -2 Pa,氧分压为 4× 10 -2 Pa时 ,薄膜具有最好的电致变色特性和最大的变色范围。进而采用低压反应离子镀工艺成功地实现在塑料基板上制备WO3 薄膜 ,并对其电致变色特性进行了研究。同时对比了采用普通电子束蒸发镀膜制备的WO3 薄膜的电致变色特性。

WO 3 electrochromic thin films were grown by low voltage reactive ion plating on glass and plastic substrates.Influence of oxygen partial pressure on the electrochromic property was studied.The results show that high quality films with the best electrochromic features and the widest variations in transmittance of all samples were obtained at an argon pressure of 2×10 -2 Pa and an oxygen partial pressure of 4×10 -2 Pa.