摘要
利用迭代傅里叶算法优化得到了特定衍射图样的位相结构,分析讨论了采用单光束激光直写系统进行逐点光刻制作2个台阶二元光学元件位相掩模的基本原理,并给出了实验结果和实验误差分析,从而为发展一种制作周期短、成本低,且无对准误差的二元光学元件的制作方法提供了一种可能。
The phase structure of given diffraction pattern was obtained by iterative Fourier transform algorithm, and the essential principle to fabricate the phase structure of two levels by laser direct writing system was discussed. The experimental result was given and the diffraction efficiency error was also analyzed. The result shows that it is possible to develop an economical way for obtaining binary beam shaping elements.
出处
《光电子技术与信息》
2004年第5期58-61,共4页
Optoelectronic Technology & Information
关键词
迭代傅里叶算法
激光直写
光束整形
二元光学元件
光刻
iterative fourier transform algorithm
laser direct writing (LDW)
beam shaping
binary optical elements(BOE)
photolithography
