摘要
采用直流磁控溅射法在钢片上制备不锈钢薄膜,通过改变溅射功率、溅射时间、真空度、氩气压强、基片与靶材间距等,研究其对薄膜结合力的影响。为获得致密度高、结合力好的不锈钢薄膜提供了可行的工艺参数范围。
Stainless steel film was prepared on steel substrate by direct current magnetron sputtering. The effects of technological parameters on the adhesion of film were studied by changing sputtering power, sputtering time, vacuum degree, argon pressure, distance between target and suhstrate. Finally feasible technological parameter ranges are provided for acquirement of stainless steel films with high density, good binding force.
出处
《材料保护》
CAS
CSCD
北大核心
2004年第11期27-28,62,共3页
Materials Protection
关键词
磁控溅射
不锈钢薄膜
工艺参数
结合力
magnetron sputtering
stainless film
technological parameter
binding force