重氮树脂单层膜上铜的无电沉积

Electroless Deposition of Cu on DR Monolayer

组装于硅片或玻璃片基片上的重氮树脂(DR)单层膜,吸附Sncl2,Pd催化剂后,通过无电沉积的方法,在这些基片上制备了铜膜.对得到的铜膜进行了SEM,XRD表征.通过选择性无电沉积,成功地制备了铜膜图像.

The electroless deposition of copper on the monolayer film of diazoresin (DR), which was fabricated on the silicon or glass surface, was performed via absorbing SnCl2 and Pd on the DR film. The copper film was characterized with SEM and XRD showing that the electroless deposition of copper on the substrate is successful. Through the selective electroless deposition the Cu film pattern was obtained.