摘要
随着微电子工艺的发展,湿法清洗越来越局限,而干法清洗能够避免湿法清洗带来的环境污染,同时生产率也大大提高。等离子体清洗在干法清洗中优势明显,本文主要介绍了等离子体清洗的机理、类型、工艺特点以及在微电子封装工艺中的应用。
Wet cleaning process is getting more and more limitated in the development of themicroelectronic industry. Dry cleaning methods would be the solutions for the environment pollu-tion caused by wet cleaning. The productivity of dry cleaning is improved as well. Plasma cleaninghas more obvious advantages than other processes. The mechanism, types, process characteristicand the applications of plasma cleaning in microelectronics packaging are presented.
出处
《半导体技术》
CAS
CSCD
北大核心
2004年第12期30-34,共5页
Semiconductor Technology
关键词
等离子体清洗
干法清洗
微电子封装
plasma cleaning
dry cleaning
microelectronics packaging