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微电子封装中等离子体清洗及其应用 被引量:20

Plasma Cleaning and Its Application in Microelectronics Packaging
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摘要 随着微电子工艺的发展,湿法清洗越来越局限,而干法清洗能够避免湿法清洗带来的环境污染,同时生产率也大大提高。等离子体清洗在干法清洗中优势明显,本文主要介绍了等离子体清洗的机理、类型、工艺特点以及在微电子封装工艺中的应用。 Wet cleaning process is getting more and more limitated in the development of themicroelectronic industry. Dry cleaning methods would be the solutions for the environment pollu-tion caused by wet cleaning. The productivity of dry cleaning is improved as well. Plasma cleaninghas more obvious advantages than other processes. The mechanism, types, process characteristicand the applications of plasma cleaning in microelectronics packaging are presented.
出处 《半导体技术》 CAS CSCD 北大核心 2004年第12期30-34,共5页 Semiconductor Technology
关键词 等离子体清洗 干法清洗 微电子封装 plasma cleaning dry cleaning microelectronics packaging
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参考文献6

  • 1PETASCH W, KEGEL B, SCHMID H, et al. Lowpressure plasma cleaning: A process for precision cleaning applications[J].Surface and Coatings Technology, 1997, 97(1-3):176-181.
  • 2CHONG Y F, GOPALAKRISHNAN R. An investigation on the plasma treatment of integrated circuit bond pads[J].Microelectronics Reliability,2000,40:1199-1206
  • 3NOWFUL J M, LOK S C, LEE S W R. Effects of plasma cleaning on the reliability of wired bonding[A]. Int Symp on Electronic Materials & Packaging[C]. Jeju Island, Korea,2001, 39-43
  • 4HSIEH J H, FONG L H, YI S. Plasma cleaning of copper leadframe with Ar and Ar/H2 gases[J].Surface and Coatings Technology,1999,112(1-3):245-249.
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  • 6WOOD L, FAIRFIELD C, WANG K. Plasma cleaning of chip scale packages for improvement of wire bond strength[A].Int Sym on Electronic Materials&Packaging[C].Hong Kong,China,2000,406-408.

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