Resolution Enhancement Technology：Integrated Process Solutions using OPC

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option for devices with features at 130 nm and less. Given the low kl value of the lithography, integrated process development is a necessary method for achieving acceptable process latitude. The application of assist features for rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting is determined by a simple geometrically derived expression. The inner and outer machine settings are determined, in turn,with the simulation of a figure of merit. The maximum value of the response surface of this FOM occurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effect that the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules for determining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of the material' s effect is discussed along with the affect on the through-pitch bias. The paper culminates with the showing of the lithographic results from the fully optimized system.

DUV lithography, using the 248 nm wavelength, is a viable manufacturing option fordevices with features at 130 nm and less. Given the low k1 value of the lithography, integrated processdevelopment is a necessary method for achieving acceptable process latitude. The application of assist featuresfor rule based OPC requires the simultaneous optimization of the mask, illumination optics and the resist.Described in this paper are the details involved in optimizing each of these aspects for line and space imaging.A reference pitch is first chosen to determine how the optics will be set. The ideal sigma setting isdetermined by a simple geometrically derived expression. The inner and outer machine settings are determined,in turn, with the simulation of a figure of merit. The maximum value of the response surface of this FOMoccurs at the optimal sigma settings. Experimental confirmation of this is shown in the paper.Assist features are used to modify the aerial image of the more isolated images on the mask. The effectthat the diffraction of the scattering bars (SBs) has on the image intensity distribution is explained. Rules fordetermining the size and placement of SBs are also given.Resist is optimized for use with off-axis illumination and assist features. A general explanation of thematerial’s effect is discussed along with the affect on the through-pitch bias. The paper culminates with theshowing of the lithographic results from the fully optimized system.